DocumentCode
2855315
Title
Enabling true design for manufacturability
Author
Kibarian, J.
fYear
2005
fDate
21-23 March 2005
Firstpage
15
Abstract
Summary form only given. Without any doubt, design-for-manufacturability (DFM) has been the hottest buzzword for the last couple of years. This is quite justifiable by the enormous challenges in nanometer technology nodes and ever increasing design-process interactions. As a result, virtually all EDA companies have focused on providing "DFM solutions". Since the concept of DFM covers an extremely broad spectrum of tasks, from the system level all the way to the manufacturing process, many of these DFM solutions are just design verification tasks re-labeled. We provide a more thorough classification of various DFM activities with emphasis on the design tasks. We also discuss the necessary condition to enable true DFM, i.e., the comprehensive characterization of the design-process interactions. We present a complete process characterization methodology that is capable of extracting all the salient process variations for a full set of product design attributes. We illustrate our talk by showing the yield loss Pareto for the leading technology nodes that cover all the dominant yield loss phenomena, including random, systematic and parametric mechanisms. We also demonstrate examples of design flows that take advantage of such a comprehensive characterization together with silicon results demonstrating the advantages of true DFM.
Keywords
Pareto distribution; design for manufacture; electronic design automation; integrated circuit design; integrated circuit yield; nanoelectronics; EDA; design flows; design for manufacturability; design verification; design-process interactions; nanometer technology nodes; product design attributes; yield loss Pareto; Circuit optimization; Circuit simulation; Circuit testing; Computational modeling; Design for manufacture; Electronic design automation and methodology; Manufacturing processes; Product design; Silicon;
fLanguage
English
Publisher
ieee
Conference_Titel
Quality of Electronic Design, 2005. ISQED 2005. Sixth International Symposium on
Conference_Location
San Jose, CA, USA
Print_ISBN
0-7695-2301-3
Type
conf
DOI
10.1109/ISQED.2005.52
Filename
1410549
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