DocumentCode :
2855719
Title :
Influence of technological processes on semiconductor surfaces in manufacture of microwave devices
Author :
Timoshenkov, S.P. ; Kalugin, V.V. ; Klochko, A.V. ; Kalugina, I.V. ; Prokopyev, E.P.
Author_Institution :
Moscow Inst. of Electron. Technol.
Volume :
2
fYear :
2005
fDate :
16-16 Sept. 2005
Firstpage :
657
Abstract :
The paper presents experimental results of investigating the influence of semiconductor wafer preparation processes on surface condition. The obtained data is expected to be used in the manufacture of integrated circuits (ICs) for microwave devices
Keywords :
MMIC; integrated circuit manufacture; microwave devices; surface morphology; integrated circuit manufacture; microwave device; semiconductor surface; semiconductor wafer preparation process; surface condition; technological process; Aerosols; Chemical processes; Manufacturing processes; Microwave devices; Microwave technology; Rough surfaces; Semiconductor device manufacture; Surface contamination; Surface roughness; Surface treatment;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Microwave & Telecommunication Technology, 2005 15th International Crimean Conference
Conference_Location :
Sevastopol, Crimea
Print_ISBN :
966-7968-80-4
Type :
conf
DOI :
10.1109/CRMICO.2005.1565080
Filename :
1565080
Link To Document :
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