DocumentCode
2855719
Title
Influence of technological processes on semiconductor surfaces in manufacture of microwave devices
Author
Timoshenkov, S.P. ; Kalugin, V.V. ; Klochko, A.V. ; Kalugina, I.V. ; Prokopyev, E.P.
Author_Institution
Moscow Inst. of Electron. Technol.
Volume
2
fYear
2005
fDate
16-16 Sept. 2005
Firstpage
657
Abstract
The paper presents experimental results of investigating the influence of semiconductor wafer preparation processes on surface condition. The obtained data is expected to be used in the manufacture of integrated circuits (ICs) for microwave devices
Keywords
MMIC; integrated circuit manufacture; microwave devices; surface morphology; integrated circuit manufacture; microwave device; semiconductor surface; semiconductor wafer preparation process; surface condition; technological process; Aerosols; Chemical processes; Manufacturing processes; Microwave devices; Microwave technology; Rough surfaces; Semiconductor device manufacture; Surface contamination; Surface roughness; Surface treatment;
fLanguage
English
Publisher
ieee
Conference_Titel
Microwave & Telecommunication Technology, 2005 15th International Crimean Conference
Conference_Location
Sevastopol, Crimea
Print_ISBN
966-7968-80-4
Type
conf
DOI
10.1109/CRMICO.2005.1565080
Filename
1565080
Link To Document