DocumentCode :
2857235
Title :
A Monte Carlo model for the study of n-type strained Silicon Schottky diodes
Author :
Galeote, Jose Ma ; Rengel, Raul ; Pascual, Elena ; Martín, María J.
Author_Institution :
Dept. de Fis. Aplic., Univ. de Salamanca, Salamanca, Spain
fYear :
2011
fDate :
8-11 Feb. 2011
Firstpage :
1
Lastpage :
4
Abstract :
A Monte Carlo investigation of charge transport in Strained Silicon Schottky diodes is presented. The effect of strain on the reverse current for several state-of-the-art barrier heights is discussed and extensively analyzed. The results show an important increase of current with strain, which allows achieving lower effective barrier heights due to the shifting of Δ2 conduction band valleys. However, the relative improvement provided by the strain is slightly less significant for lower barrier heights due to the changes in tunneling and thermionic components of the total current.
Keywords :
Monte Carlo methods; Schottky diodes; silicon; Monte Carlo model; Si; barrier heights; charge transport; n-type strained Schottky diodes; reverse current; thermionic components; tunneling components; Absorption; Metals; Schottky barriers; Schottky diodes; Silicon; Strain; Tunneling; Monte Carlo simulation; Schottky diode; Strain;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Electron Devices (CDE), 2011 Spanish Conference on
Conference_Location :
Palma de Mallorca
Print_ISBN :
978-1-4244-7863-7
Type :
conf
DOI :
10.1109/SCED.2011.5744166
Filename :
5744166
Link To Document :
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