Title :
Analysis of the New Latchup Model for Deep Sub-micron Integrated Circuits
Author :
Dong, Pan ; Fan, Long ; Yue, Suge ; Zheng, Hongchao ; Du, Shougang
Author_Institution :
Design Dept., Beijing Microelectron. Technol. Inst., Beijing, China
Abstract :
The paper simulated the SEL happening process of the CMOS inverter fabricated the 0.18um technology. The results show that the intrinsic parasitic lateral NPN (QN) and PNP (QP) transistor of the NMOS and PMOS in the CMOS inverter, which could result in the changes of the voltage and the current of the drain when the SEL happening, can delay latch up occurring time and reduce the latch up current. The origin model was improved based on the simulated results. The result studying the improved latch up model shows that the smaller ratios of the internal parasitic resistors between RW1 and RW2 or RS1 and RS2 could lead to smaller latch up current and delay more time for the latch up occurrence.
Keywords :
CMOS integrated circuits; integrated circuit modelling; CMOS inverter; NMOS; PMOS; PNP transistor; SEL happening process; deep sub-micron integrated circuits; intrinsic parasitic lateral NPN; latchup model; size 0.18 mum; CMOS integrated circuits; Cathodes; Integrated circuit modeling; Logic gates; MOS devices; Transient analysis; Transistors; (SEL); Single event effects (SEE); inverter; large scale integrated circuit (VLSI); model; transistor;
Conference_Titel :
Dependable, Autonomic and Secure Computing (DASC), 2011 IEEE Ninth International Conference on
Conference_Location :
Sydney, NSW
Print_ISBN :
978-1-4673-0006-3
DOI :
10.1109/DASC.2011.34