Title :
An investigation of polysilicon deposition techniques for non-standard substrates
Author :
Magill, S.H.S. ; Quinn, L.J. ; Mitchell, S.J.N. ; Armstrong, B.M. ; Gamble, H.S.
Author_Institution :
Dept. of Electr. & Electron. Eng., Queen´´s Univ. of Belfast, UK
Abstract :
Polysilicon films on non-silicon substrates are required for a wide range of applications, including large area electronics. A large area CVD system compatible with cluster tool type processing has been developed. A single-chamber multiprocess system has been developed which has the capability of performing multiple sequential process steps. This paper describes the two cold walled, low pressure CVD systems and presents results on the characterisation of the films produced
Keywords :
chemical vapour deposition; elemental semiconductors; semiconductor growth; silicon; characterisation; cluster tool type processing; cold wall CVD systems; large area CVD system; large area electronics; low pressure CVD systems; multiple sequential process steps; non-standard substrates; polycrystalline Si deposition; polysilicon deposition techniques; semiconductors; single-chamber multiprocess system;
Conference_Titel :
Poly-Si Devices and Applications, IEE Colloquium on
Conference_Location :
London
