Title :
Loss characterization and surface passivation in silicon microphotonics
Author :
Borselli, Matthew ; Johnson, Thomas J. ; Painter, Oskar
Author_Institution :
Dept. of Appl. Phys., California Inst. of Technol., Pasadena, CA
Abstract :
High-quality factor (Q~1-5times106) microresonators are used to probe the optical properties of silicon-on-insulator surfaces with 0.04% monolayer sensitivity. A rapid and accurate measurement of linear and nonlinear absorption is utilized to assess new surface-passivation techniques.
Keywords :
elemental semiconductors; micro-optics; micromechanical resonators; optical properties; passivation; silicon; silicon-on-insulator; Si; high quality factor; loss characterization; microresonators; nonlinear absorption; optical properties; silicon microphotonics; silicon-on-insulator surfaces; surface passivation; Absorption; Nonlinear optics; Optical losses; Optical modulation; Optical resonators; Optical sensors; Optical surface waves; Passivation; Silicon; Surface treatment; (190.4870) Thermo-optical effects; (230.5750) Resonators; (240.0240) Optics at surfaces;
Conference_Titel :
Lasers and Electro-Optics, 2006 and 2006 Quantum Electronics and Laser Science Conference. CLEO/QELS 2006. Conference on
Conference_Location :
Long Beach, CA
Print_ISBN :
978-1-55752-813-1
Electronic_ISBN :
978-1-55752-813-1
DOI :
10.1109/CLEO.2006.4627618
