• DocumentCode
    2862284
  • Title

    The impact of gate insulator dielectric constant on performance of CNTFETs at different ambient temperatures

  • Author

    Shirazi, Shaahin G. ; Mirzakuchaki, Sattar

  • Author_Institution
    EE. Dept., Univ. of Sci. & Technol., Tehran, Iran
  • fYear
    2011
  • fDate
    21-24 June 2011
  • Firstpage
    1
  • Lastpage
    2
  • Abstract
    Carbon nanotube field effect transistors are the most promising candidate for replacing of current silicon transistor technology. Choosing a suitable dielectric constant for a specific temperature range is important in determining device performance. For higher dielectric constant, rising up the temperature causes current ratio to diminish, while at lower dielectric constants the current ratio increases. An interesting case is observed for transistors with dielectric constants in the middle range which exhibit an approximately constant current ratio for all ambient temperatures considered.
  • Keywords
    carbon nanotubes; field effect transistors; permittivity; CNTFET; ambient temperatures; carbon nanotube field effect transistors; gate insulator dielectric constant; silicon transistor technology; CNTFETs; Carbon nanotubes; Dielectric constant; Leakage current; Logic gates; Temperature; CNTFET; NEGF; ambient temperature; device performance; gate insulator dielectric;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Nanoelectronics Conference (INEC), 2011 IEEE 4th International
  • Conference_Location
    Tao-Yuan
  • ISSN
    2159-3523
  • Print_ISBN
    978-1-4577-0379-9
  • Electronic_ISBN
    2159-3523
  • Type

    conf

  • DOI
    10.1109/INEC.2011.5991722
  • Filename
    5991722