DocumentCode
2862337
Title
X-ray diffraction analysis of self-ordered porous anodic alumina
Author
Wu, Ya-Fen ; Huang, Jeng-Kuang ; Lee, Jiunn-Chyi
Author_Institution
Dept. of Electron. Eng., Ming Chi Univ. of Technol., Taipei, Taiwan
fYear
2011
fDate
21-24 June 2011
Firstpage
1
Lastpage
2
Abstract
We report on the structural properties of porous anodic alumina (PAA) film produced by the anodization technique under different annealing temperatures. X-ray diffraction (XRD) measurement was performed and simulated by theoretical analysis model. From the analysis, it is found that sample prepared with higher annealing temperature exhibits larger interpore spacing and the pore array uniformity is slightly lowered down with higher annealing temperature. To verify the theoretical calculation results, images of the sample surfaces were obtained by field-emission scanning electron microscopic (FE-SEM). The FE-SEM images of the surface morphology of the samples are coinciding with the results obtained from XRD line profile analysis.
Keywords
X-ray diffraction; annealing; anodisation; field emission electron microscopy; surface morphology; FE-SEM images; X-ray diffraction analysis; X-ray diffraction measurement; XRD line profile analysis; annealing temperature; anodization technique; field-emission scanning electron microscopic; interpore spacing; pore array uniformity; porous anodic alumina film; self-ordered porous anodic alumina; surface morphology; Aluminum; Annealing; Arrays; Films; Surface morphology; X-ray diffraction; X-ray scattering; Fourier transform; X-ray diffraction; nanostructure size distribution; porous anodic alumina;
fLanguage
English
Publisher
ieee
Conference_Titel
Nanoelectronics Conference (INEC), 2011 IEEE 4th International
Conference_Location
Tao-Yuan
ISSN
2159-3523
Print_ISBN
978-1-4577-0379-9
Electronic_ISBN
2159-3523
Type
conf
DOI
10.1109/INEC.2011.5991726
Filename
5991726
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