Fabrication of metal nanostructures by atomic force microscopy nanomachining and related applications

Author

Lin, Hsin-Yu ; Chen, Hsiang-An ; Lin, Heh-Nan

Author_Institution

Dept. of Mater. Sci. & Eng., Nat. Tsing Hua Univ., Hsinchu, Taiwan

fYear

2011

fDate

21-24 June 2011

Firstpage

1

Lastpage

2

Abstract

In this work, the fabrication of metal nanostructures by a combination of atomic force microscopy nanomachining on a thin polymer resist, metal coating and lift-off is presented. Nanodots with sizes down to 20 nm and nanowires with widths ranging between 40 and 100 nm have been successfully created by nanoindenting and nanoscratching. The results exemplify the feasibility and effectiveness of the present technique as an alternative to e-beam lithography. The localized surface plasmon resonance properties of the fabricated nanostructures are characterized. The chemical sensing capability of a single nanowire based on resistance increase is also demonstrated.

Keywords

atomic force microscopy; chemical sensors; electrical resistivity; gold; machining; nanofabrication; nanoindentation; nanosensors; nanowires; surface plasmon resonance; Au; atomic force microscopy; chemical sensing; lift-off; localized surface plasmon resonance; metal nanostructures; nanodots; nanoindentation; nanomachining; nanoscratching; nanowires; resistance; thin polymer resist; Fabrication; Force; Gold; Nanobioscience; Nanostructures; Substrates; atomic force microscopy (AFM) nanomachining; chemical sensing; localized surface plasmon resonance (LSPR); metal nanodot; metal nanowire; scanning probe lithography (SPL);

fLanguage

English

Publisher

ieee

Conference_Titel

Nanoelectronics Conference (INEC), 2011 IEEE 4th International

Conference_Location

Tao-Yuan

ISSN

2159-3523

Print_ISBN

978-1-4577-0379-9

Electronic_ISBN

2159-3523

Type

conf

DOI

10.1109/INEC.2011.5991793

Filename

5991793