Ultrafast lasers for nano-material growth and processing

Author

Mao, Samuel S.

Author_Institution

Dept. of Mech. Eng. & Lawrence Berkeley Nat. Lab., Univ. of California, Berkeley, CA

fYear

2006

fDate

21-26 May 2006

Firstpage

1

Lastpage

2

Abstract

Laser ablation is a well-established solid-state film growth technique that typically involves applying a nanosecond laser beam to ablate a target material, followed by depositing the precursor vapor onto a substrate. A main technical obstacle for growing thin films with conventional nanosecond laser ablation is the formation of micron-sized particulates or droplets, which would be unacceptable for making materials with nanometer scale structures.

Keywords

high-speed optical techniques; laser ablation; nanotechnology; pulsed laser deposition; surface contamination; vapour deposited coatings; laser ablation; micron sized particulate formation; nanomaterial growth; nanomaterial processing; nanosecond laser beam; precursor vapor deposition; solid-state film growth technique; ultrafast laser; Free electron lasers; Interference; Laser ablation; Laser theory; Lattices; Optical materials; Optical pulses; Pulsed laser deposition; Solid lasers; Surface emitting lasers;

fLanguage

English

Publisher

ieee

Conference_Titel

Lasers and Electro-Optics, 2006 and 2006 Quantum Electronics and Laser Science Conference. CLEO/QELS 2006. Conference on

Conference_Location

Long Beach, CA

Print_ISBN

978-1-55752-813-1

Electronic_ISBN

978-1-55752-813-1

Type

conf

DOI

10.1109/CLEO.2006.4627756

Filename

4627756