Title :
Ultrafast lasers for nano-material growth and processing
Author_Institution :
Dept. of Mech. Eng. & Lawrence Berkeley Nat. Lab., Univ. of California, Berkeley, CA
Abstract :
Laser ablation is a well-established solid-state film growth technique that typically involves applying a nanosecond laser beam to ablate a target material, followed by depositing the precursor vapor onto a substrate. A main technical obstacle for growing thin films with conventional nanosecond laser ablation is the formation of micron-sized particulates or droplets, which would be unacceptable for making materials with nanometer scale structures.
Keywords :
high-speed optical techniques; laser ablation; nanotechnology; pulsed laser deposition; surface contamination; vapour deposited coatings; laser ablation; micron sized particulate formation; nanomaterial growth; nanomaterial processing; nanosecond laser beam; precursor vapor deposition; solid-state film growth technique; ultrafast laser; Free electron lasers; Interference; Laser ablation; Laser theory; Lattices; Optical materials; Optical pulses; Pulsed laser deposition; Solid lasers; Surface emitting lasers;
Conference_Titel :
Lasers and Electro-Optics, 2006 and 2006 Quantum Electronics and Laser Science Conference. CLEO/QELS 2006. Conference on
Conference_Location :
Long Beach, CA
Print_ISBN :
978-1-55752-813-1
Electronic_ISBN :
978-1-55752-813-1
DOI :
10.1109/CLEO.2006.4627756