DocumentCode :
2863496
Title :
Ultrafast lasers for nano-material growth and processing
Author :
Mao, Samuel S.
Author_Institution :
Dept. of Mech. Eng. & Lawrence Berkeley Nat. Lab., Univ. of California, Berkeley, CA
fYear :
2006
fDate :
21-26 May 2006
Firstpage :
1
Lastpage :
2
Abstract :
Laser ablation is a well-established solid-state film growth technique that typically involves applying a nanosecond laser beam to ablate a target material, followed by depositing the precursor vapor onto a substrate. A main technical obstacle for growing thin films with conventional nanosecond laser ablation is the formation of micron-sized particulates or droplets, which would be unacceptable for making materials with nanometer scale structures.
Keywords :
high-speed optical techniques; laser ablation; nanotechnology; pulsed laser deposition; surface contamination; vapour deposited coatings; laser ablation; micron sized particulate formation; nanomaterial growth; nanomaterial processing; nanosecond laser beam; precursor vapor deposition; solid-state film growth technique; ultrafast laser; Free electron lasers; Interference; Laser ablation; Laser theory; Lattices; Optical materials; Optical pulses; Pulsed laser deposition; Solid lasers; Surface emitting lasers;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Lasers and Electro-Optics, 2006 and 2006 Quantum Electronics and Laser Science Conference. CLEO/QELS 2006. Conference on
Conference_Location :
Long Beach, CA
Print_ISBN :
978-1-55752-813-1
Electronic_ISBN :
978-1-55752-813-1
Type :
conf
DOI :
10.1109/CLEO.2006.4627756
Filename :
4627756
Link To Document :
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