Angstrom-scale ultra smooth IBAD Au thin films by in-situ ion figuring: A top down way

Author

Hsiao, C.N. ; Chiu, P.K. ; Liu, D.R. ; Su, C.Y. ; Chen, F.Z.

Author_Institution

Nat. Appl. Res. Labs., Instrum. Technol. Res. Center, Hsinchu, Taiwan

fYear

2011

fDate

21-24 June 2011

Firstpage

1

Lastpage

2

Abstract

Angstrom-scale surface roughness ion beam assisted deposition (IBAD) Au films were fabricated by in-situ optical monitored ion figuring. The surface roughness was characterized by AFM and XRR analysis. It was found that the root-mean-square (RMS) surface roughness has been improved from above 6 nm for an as coat IBAD Au film to 0.462 nm for the in-situ optical monitored ion figuring treated IBAD Au film, respectively. Furthermore, films are characterized by a significantly lower RMS surface roughness and narrower peak-to-valley surface topological height distribution.

Keywords

atomic force microscopy; ion beam assisted deposition; mean square error methods; nanoelectronics; surface roughness; thin films; AFM analysis; Angstrom-scale surface roughness; Angstrom-scale ultra smooth IBAD Au thin film; XRR analysis; fabrication; in-situ optical monitored ion figuring; ion beam assisted deposition; peak-to-valley surface topological height distribution; root-mean-square; Films; Gold; Monitoring; Rough surfaces; Surface roughness; Surface topography; Surface treatment; AFM; IBAD; RMS; SPR; XRR;

fLanguage

English

Publisher

ieee

Conference_Titel

Nanoelectronics Conference (INEC), 2011 IEEE 4th International

Conference_Location

Tao-Yuan

ISSN

2159-3523

Print_ISBN

978-1-4577-0379-9

Electronic_ISBN

2159-3523

Type

conf

DOI

10.1109/INEC.2011.5991801

Filename

5991801