Title : 
Slow light in photorefractive phase-engineered index structures
         
        
            Author : 
Horn, W. ; Bassewitz, J.V. ; Denz, C.
         
        
            Author_Institution : 
Center for Nonlinear Sci., Westfalische Wilhelms-Univ., Munster, Germany
         
        
        
        
        
        
            Abstract : 
The authors investigate all-optical tunable index structures, induced in photorefractive materials for the observation of room-temperature slow light. The potential of this technique lies in the possibility of reconfiguration in different spectral windows at low pump intensities and transmission properties comparable to fiber-based resonant delay-lines. Volume-holographic gratings offer low insertion loss and narrow bandwidth selectivity but are nearly insensitive to photo-induced damage in the NIR, thus making them suitable for telecom applications, e.g. WDM filters. The narrow spectral features of the thick volume gratings produce a steep slope in the dispersion which can be considered as the basis of all slow-light experiments. Investigations of increased group index of single band-stop configurations in photorefractive materials without gain have proven this concept.
         
        
            Keywords : 
holographic gratings; photorefractive materials; wavelength division multiplexing; WDM filters; all-optical tunable index structures; phase-engineered index structures; photorefractive index structures; photorefractive materials; slow light; spectral windows; temperature 293 K to 298 K; thick volume gratings; transmission properties; volume holographic gratings; Bandwidth; Delay; Gratings; Insertion loss; Photorefractive effect; Photorefractive materials; Resonance; Slow light; Telecommunications; Wavelength division multiplexing;
         
        
        
        
            Conference_Titel : 
Lasers and Electro-Optics 2009 and the European Quantum Electronics Conference. CLEO Europe - EQEC 2009. European Conference on
         
        
            Conference_Location : 
Munich
         
        
            Print_ISBN : 
978-1-4244-4079-5
         
        
            Electronic_ISBN : 
978-1-4244-4080-1
         
        
        
            DOI : 
10.1109/CLEOE-EQEC.2009.5196407