DocumentCode :
286471
Title :
Electrostatic separation of CVD ultra-fine particles at high temperature
Author :
Yamamoto, Hideo ; Masuda, Senichi
Author_Institution :
Dept. of Bioeng., Soka Univ., Tokyo, Japan
fYear :
1992
fDate :
4-9 Oct 1992
Firstpage :
1551
Abstract :
The feasibility of electrostatic precipitation above 500°C was demonstrated for separation of ultrafine particles synthesized by thermally activated CVD (chemical vapor deposition) directly from the reaction gas stream. Silicon-nitride particles were prepared from a (SiCl4+NH3)/N2 gas system at 1200°C. This process produces NH4Cl as solid particles at normal temperature, as a by-product. The high-temperature electrostatic precipitation method should collect only the Si3N4 particles directly from the reaction gas stream because the sublimation temperature of NH4Cl is about 340°C. An electrode system for corona discharge that can generate a stable corona discharge even in the reaction gas atmosphere at high temperature was developed. X-ray diffraction analysis shows that no NH4Cl particles were collected at 500°C
Keywords :
X-ray diffraction examination of materials; chemical vapour deposition; corona; electrodes; electrostatic precipitators; silicon compounds; 1200 degC; 340 degC; 500 degC; CVD ultra-fine particles; N2; NH3; NH4Cl; Si3N4 particles; SiCl4; X-ray diffraction analysis; corona discharge; electrode system; electrostatic precipitation; high temperature; reaction gas stream; sublimation temperature; thermally activated CVD; Atmosphere; Biomedical engineering; Chemical technology; Chemical vapor deposition; Corona; Electrodes; Electrostatics; Nitrogen; Solids; Temperature dependence;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Industry Applications Society Annual Meeting, 1992., Conference Record of the 1992 IEEE
Conference_Location :
Houston, TX
Print_ISBN :
0-7803-0635-X
Type :
conf
DOI :
10.1109/IAS.1992.244380
Filename :
244380
Link To Document :
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