DocumentCode
2864779
Title
Ultrafast laser deposition of oxide glass film
Author
Jose, G. ; Irannejad, M. ; Steenson, D.P. ; Jha, A.
Author_Institution
Inst. for Mater. Res., Univ. Leeds, Leeds, UK
fYear
2009
fDate
14-19 June 2009
Firstpage
1
Lastpage
1
Abstract
This paper reports the use of femtosecond laser ablation of glass target to fabricate oxide glass films. The ultrafast laser deposition offers much larger film growth rates and less particulates comparing to excimer laser deposition. This will enable one to fabricate good optical quality glass films thicker than 1 micron for planar waveguides and photonic integrated devices.
Keywords
high-speed optical techniques; optical films; optical glass; optical planar waveguides; pulsed laser deposition; oxide glass film; photonic integrated devices; planar waveguides; ultrafast laser deposition; Glass; Integrated optics; Laser ablation; Optical devices; Optical films; Optical planar waveguides; Optical waveguides; Planar waveguides; Ultrafast optics; Waveguide lasers;
fLanguage
English
Publisher
ieee
Conference_Titel
Lasers and Electro-Optics 2009 and the European Quantum Electronics Conference. CLEO Europe - EQEC 2009. European Conference on
Conference_Location
Munich
Print_ISBN
978-1-4244-4079-5
Electronic_ISBN
978-1-4244-4080-1
Type
conf
DOI
10.1109/CLEOE-EQEC.2009.5196464
Filename
5196464
Link To Document