DocumentCode
2864827
Title
On-chip laser-locking of tritium in silica film using deep UV laser irradiation
Author
Liu, Baojun ; Kherani, Nazir P. ; Zukotynski, Stefan ; Chen, Kevin P.
Author_Institution
Dept. of Electr. & Comput. Eng., Univ. of Pittsburgh, Pittsburgh, PA
fYear
2006
fDate
21-26 May 2006
Firstpage
1
Lastpage
2
Abstract
Tritium locking in silica films is demonstrated using a combination of high-pressure tritium loading and 248-nm KrF laser irradiation. This work offers a safe and simple approach to integrate radioisotope micro-power source on-chip for micro-electronic applications.
Keywords
krypton compounds; laser beam effects; laser mode locking; silicon compounds; tritium; KrF; SiO2; deep UV laser irradiation; high-pressure tritium loading; microelectronic applications; on-chip laser-locking; radioisotope micropower source; silica film; tritium locking; wavelength 248 nm; Bonding; Fiber lasers; Glass; Hydrogen; Ionization; Laser stability; Pulsed laser deposition; Silicon compounds; Temperature; Waveguide lasers; (140.3390) laser materials processing; (160.6030) silica;
fLanguage
English
Publisher
ieee
Conference_Titel
Lasers and Electro-Optics, 2006 and 2006 Quantum Electronics and Laser Science Conference. CLEO/QELS 2006. Conference on
Conference_Location
Long Beach, CA
Print_ISBN
978-1-55752-813-1
Electronic_ISBN
978-1-55752-813-1
Type
conf
DOI
10.1109/CLEO.2006.4627848
Filename
4627848
Link To Document