Title :
F2 laser patterning indium tin oxide (ITO) thin film coating on glass substrates
Author :
Xu, M.Y. ; Lilge, L.D. ; Herman, P.R.
Author_Institution :
Dept. of Electr. & Comput. Eng., Univ. of Toronto, Toronto, ON
Abstract :
The first experimental results of machining indium tin oxide thin films with the 157 nm F2 laser are reported. A low 0.27-J/cm2 ablation threshold and stoichiometric removal enable electrode patterning for biochip applications.
Keywords :
fluorine; glass; indium compounds; laser beam machining; laser materials processing; optical films; F2 laser patterning; ITO; ablation threshold; biochip applications; electrode patterning; glass substrates; indium tin oxide; machining; stoichiometric removal; thin film coating; wavelength 157 nm; Atomic force microscopy; Coatings; Etching; Indium tin oxide; Laser ablation; Laser modes; Optical films; Optical microscopy; Scanning electron microscopy; Surface morphology; (310.3840) Materials and process characterization; (310.6870) Thin films, other properties;
Conference_Titel :
Lasers and Electro-Optics, 2006 and 2006 Quantum Electronics and Laser Science Conference. CLEO/QELS 2006. Conference on
Conference_Location :
Long Beach, CA
Print_ISBN :
978-1-55752-813-1
Electronic_ISBN :
978-1-55752-813-1
DOI :
10.1109/CLEO.2006.4627850
