• DocumentCode
    2865454
  • Title

    Fabrication of submicron Si spheres on SOI platform by using excimer laser reformation technique

  • Author

    Hung, S.C. ; Shiu, S.C. ; Chao, C.S. ; Lin, C.F.

  • Author_Institution
    Grad. Inst. of Photonics & Optoelectron., Nat. Taiwan Univ., Taipei, Taiwan
  • fYear
    2009
  • fDate
    14-19 June 2009
  • Firstpage
    1
  • Lastpage
    1
  • Abstract
    Since silicon is the dominating material in current integrated circuit industry, fabricating microspheres on a Si-based substrate contributes to compact and low-cost photonics for mass-market applications. The authors present a technique applying the homogenized KrF excimer laser reformation to fabricate crystalline Si spheres on the SOI platform.
  • Keywords
    excimer lasers; krypton compounds; silicon-on-insulator; substrates; KrF; SOI platform; Si; crystalline silicon spheres; excimer laser reformation; integrated circuit industry; microspheres; silicon based substrate; Crystalline materials; Crystallization; Lighting; Optical device fabrication; Optical materials; Optimized production technology; Photonic crystals; Q factor; Scanning electron microscopy; Silicon;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Lasers and Electro-Optics 2009 and the European Quantum Electronics Conference. CLEO Europe - EQEC 2009. European Conference on
  • Conference_Location
    Munich
  • Print_ISBN
    978-1-4244-4079-5
  • Electronic_ISBN
    978-1-4244-4080-1
  • Type

    conf

  • DOI
    10.1109/CLEOE-EQEC.2009.5196498
  • Filename
    5196498
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=2865454