• DocumentCode
    2865592
  • Title

    Energy enhancement of a highly coherent VUV source at 125 nm for nanopatterning applications

  • Author

    Philippet, L. ; Chénais, S. ; Forget, S. ; Castex, M.-C.

  • Author_Institution
    Lab. de Phys. des Lasers, Univ. Paris 13, Villetaneuse, France
  • fYear
    2009
  • fDate
    14-19 June 2009
  • Firstpage
    1
  • Lastpage
    1
  • Abstract
    In this paper we will review how the main parameters of the plume (energy density on Hg pool, time delay between the plume creation and the nonlinear interaction, nature of the background gas) can be monitored to maximize the VUV yield. Time-resolved snapshots of the plume, time-resolved spectra of the plume luminescence as well as images of the UV-beam-induced fluorescence, have allowed determining mean velocities and estimates of the atom densities in various cases. The highest energy output at 125 nm (>10 muJ) was obtained when the plume was constrained from expanding in an Argon atmosphere (0.5 bar). With respect to a plume expanding in a vacuum, this configuration allows a higher density and a higher stability since windows are protected; in addition the time delay between the pulse creating the plume and the nonlinear interaction is much longer (up to 20 mus), which opens the way towards quasi-CW operation.
  • Keywords
    nanopatterning; ultraviolet lithography; Argon atmosphere; Hg pool; UV-beam-induced fluorescence; VUV yield; atom densities; energy density; energy enhancement; highly coherent VUV source; nanopatterning applications; nonlinear interaction; plume creation; plume luminescence; time delay; time-resolved spectra; wavelength 125 nm; Argon; Atmosphere; Condition monitoring; Delay effects; Fluorescence; Luminescence; Mercury (metals); Nanopatterning; Protection; Stability;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Lasers and Electro-Optics 2009 and the European Quantum Electronics Conference. CLEO Europe - EQEC 2009. European Conference on
  • Conference_Location
    Munich
  • Print_ISBN
    978-1-4244-4079-5
  • Electronic_ISBN
    978-1-4244-4080-1
  • Type

    conf

  • DOI
    10.1109/CLEOE-EQEC.2009.5196504
  • Filename
    5196504