• DocumentCode
    2865887
  • Title

    A modified drift-diffusion model for sub-micron devices

  • Author

    Wu, Shangli ; Anwar, A.F.M.

  • Author_Institution
    Dept. of Electr. & Comput. Eng., Connecticut Univ., Storrs, CT, USA
  • fYear
    2000
  • fDate
    2000
  • Firstpage
    123
  • Lastpage
    127
  • Abstract
    It is well recognized that the use of low field mobility μ and the diffusion constant D in the drift-diffusion equation becomes questionable in narrow based HBTs or short gate FETs. For short samples the transport parameters not only become field and position dependent, but also initial distribution dependent. Moreover, the diffusion constant, which is defined for a stationary process, becomes an ill-defined parameter in very short devices. In this paper a modified drift-diffusion model that can be used in sub-micron devices is reported
  • Keywords
    semiconductor device models; FET; HBT; diffusion constant; drift-diffusion model; low-field mobility; submicron device; transport parameters; Electromagnetic compatibility; Electron mobility; Equations; FETs; Frequency; Gallium arsenide; Heterojunction bipolar transistors; Optical scattering; Phonons; Steady-state;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    High Performance Devices, 2000. Proceedings. 2000 IEEE/Cornell Conference on
  • Conference_Location
    Ithaca, NY
  • ISSN
    1529-3068
  • Print_ISBN
    0-7803-6381-7
  • Type

    conf

  • DOI
    10.1109/CORNEL.2000.902527
  • Filename
    902527