DocumentCode :
2865887
Title :
A modified drift-diffusion model for sub-micron devices
Author :
Wu, Shangli ; Anwar, A.F.M.
Author_Institution :
Dept. of Electr. & Comput. Eng., Connecticut Univ., Storrs, CT, USA
fYear :
2000
fDate :
2000
Firstpage :
123
Lastpage :
127
Abstract :
It is well recognized that the use of low field mobility μ and the diffusion constant D in the drift-diffusion equation becomes questionable in narrow based HBTs or short gate FETs. For short samples the transport parameters not only become field and position dependent, but also initial distribution dependent. Moreover, the diffusion constant, which is defined for a stationary process, becomes an ill-defined parameter in very short devices. In this paper a modified drift-diffusion model that can be used in sub-micron devices is reported
Keywords :
semiconductor device models; FET; HBT; diffusion constant; drift-diffusion model; low-field mobility; submicron device; transport parameters; Electromagnetic compatibility; Electron mobility; Equations; FETs; Frequency; Gallium arsenide; Heterojunction bipolar transistors; Optical scattering; Phonons; Steady-state;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
High Performance Devices, 2000. Proceedings. 2000 IEEE/Cornell Conference on
Conference_Location :
Ithaca, NY
ISSN :
1529-3068
Print_ISBN :
0-7803-6381-7
Type :
conf
DOI :
10.1109/CORNEL.2000.902527
Filename :
902527
Link To Document :
بازگشت