Title :
Enhancement of the two-photon absorption and nonlinear-optical refraction in mesoporous silicon
Author :
Golovan, L.A. ; Kopylovsky, M.A. ; Zabotnov, S.V. ; Piskunov, N.A. ; Gayvoronsky, V. Yo ; Kashkarov, P.K. ; Timoshenko, V.Yu.
Author_Institution :
Phys. Dept., M.V. Lomonosov Moscow State Univ., Lomonosov, Russia
Abstract :
The mode-locked Nd:YAG laser radiation (1.064 mum, 40 ps) transmitted through the samples was employed to study the two-photon absorption and nonlinear refraction of porous silicon. The mesoporous Si sample demonstrates self-focusing. The nonlinear refraction at low laser intensities and two-photon absorption at high laser intensities are sensitive to the laser radiation polarization. The light self-action mechanism demonstrated at low intensities tends to be saturated.
Keywords :
elemental semiconductors; light polarisation; mesoporous materials; nonlinear optical susceptibility; optical materials; optical self-focusing; porous semiconductors; refractive index; silicon; two-photon processes; Si; laser intensities; laser radiation polarization; mesoporous silicon sample; mode-locked laser radiation; nonlinear refraction; porous silicon; self-action mechanism; self-focusing; time 40 ps; two-photon absorption; wavelength 1.064 mum; Absorption; Birefringence; Crystallization; Infrared spectra; Mesoporous materials; Nonlinear optics; Optical films; Optical materials; Optical refraction; Silicon;
Conference_Titel :
Lasers and Electro-Optics 2009 and the European Quantum Electronics Conference. CLEO Europe - EQEC 2009. European Conference on
Conference_Location :
Munich
Print_ISBN :
978-1-4244-4079-5
Electronic_ISBN :
978-1-4244-4080-1
DOI :
10.1109/CLEOE-EQEC.2009.5196537
