DocumentCode
2866238
Title
Case study for root cause analysis of yield problems
Author
Malinaric, Dan ; Hoffmeister, Richard R. ; Sun, Cindy
Author_Institution
Atmel Corp., Colorado Springs, CO, USA
fYear
2000
fDate
2000
Firstpage
8
Lastpage
13
Abstract
New RAD (rapid application development) tools, software and high performance database technology enable development of analysis software that performs tasks that were either too complex or time-consuming with older technology. The Klarity ACE (Advanced Correlation Engine) software package was specifically developed to meet the analysis needs of practicing semiconductor professionals. It can be applied to the needs of yield, product development, and test engineers and also provides many tools for process engineers to analyze detailed processing equipment data such as chamber etch rates, gas flows, and equipment-related data. Besides supplying tools for routine analysis tasks such as making control and capability charts; advanced features such as commonality analyses and tool variance and sensitivity are included
Keywords
etching; integrated circuit testing; integrated circuit yield; product development; production engineering computing; production testing; Advanced Correlation Engine; Klarity ACE; RAD; capability charts; chamber etch rates; commonality analyses; database technology; equipment-related data; gas flows; processing equipment data; product development; rapid application development; software package; test engineers; tool variance; yield problems; Analysis of variance; Application software; Data engineering; Databases; Engines; Performance analysis; Product development; Software packages; Software performance; Software tools;
fLanguage
English
Publisher
ieee
Conference_Titel
Advanced Semiconductor Manufacturing Conference and Workshop, 2000 IEEE/SEMI
Conference_Location
Boston, MA
ISSN
1078-8743
Print_ISBN
0-7803-5921-6
Type
conf
DOI
10.1109/ASMC.2000.902551
Filename
902551
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