DocumentCode :
2866397
Title :
Technology assessment of commercially available critical area extraction tools
Author :
Long, Christopher ; Maynard, Daniel ; Bjornsen, M.A.
Author_Institution :
SEMATECH, Austin, TX, USA
fYear :
2000
fDate :
2000
Firstpage :
76
Lastpage :
82
Abstract :
In the 1990s, the semiconductor industry witnessed a philosophical change in the subject of modeling wafer final test yields. The calculation of average faults per chip has been historically calculated as the product of chip area and fault density, and often incorrectly referred to as defect density. For more than 20 years, several pioneering researchers, representing both academia and industry, have advocated a more accurate estimation of average faults per chip by using critical area, a better metric of chip sensitivity to defect mechanisms. The implementation of this concept requires sophisticated software tools that interrogate the physical design data. At the request of the member companies, International SEMATECH launched a study in 1999 of four commercially available critical area extraction (CAE) tools, with a primary objective of providing an independent technical assessment of capability, performance, accuracy, ease of use, features, and other distinguishing characteristics. Each of the tools were run on several product designs from Agilent Technologies and IBM Microelectronics. The CAE tools were all installed and evaluated at a common member company location, and each of the tool suppliers were visited, providing detailed visibility into the supplier´s environment. This paper will review the evaluation methodology, and summarize the findings and results of this International SEMATECH sponsored study
Keywords :
computer aided engineering; integrated circuit testing; integrated circuit yield; production testing; semiconductor process modelling; Agilent Technologies; CAE tools; IBM Microelectronics; International SEMATECH; chip area; critical area extraction tools; defect density; defect mechanisms; evaluation methodology; fault density; semiconductor industry; wafer final test yields; Algorithm design and analysis; Computer aided engineering; Data mining; Electronics industry; Microelectronics; Rivers; Semiconductor device manufacture; Semiconductor device modeling; Semiconductor device testing; USA Councils;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Advanced Semiconductor Manufacturing Conference and Workshop, 2000 IEEE/SEMI
Conference_Location :
Boston, MA
ISSN :
1078-8743
Print_ISBN :
0-7803-5921-6
Type :
conf
DOI :
10.1109/ASMC.2000.902562
Filename :
902562
Link To Document :
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