• DocumentCode
    2866601
  • Title

    Bitmapped yield enhancement solutions: a case study of escalating yield

  • Author

    Jacobson, Lee ; Crain, David ; Joyce, Chris

  • Author_Institution
    Nat. Semicond., USA
  • fYear
    2000
  • fDate
    2000
  • Firstpage
    139
  • Lastpage
    140
  • Abstract
    National Semiconductor has an ongoing commitment to its customers to provide rapid product development, comprehensive cycles of learning, and world class yields. Through the development of systems which move bitmapping from engineering tools requiring massive effort to maintain and run, to the highly automated arena of manufacturing, a much finer partitioning of yield, and a more effective deployment of yield enhancement resources may result. Tying in a vast optical and SEM review infrastructure allows for extremely rapid feedback for inline detectable anomalies, including optical and SEM images for each inspected lot. Bitmapping as the framework for rapid failure analysis provides the accuracy needed to rapidly identify and assign root cause to failures not found with inline inspection tools. Development of the highly integrated and automated bitmapping system at National Semiconductor has enabled extremely rapid yield learning rates and is a key component in the ability to maintain world class yields with leading edge technologies. Looking forward, bitmapping will accelerate yield learning, and hold an important role in process development as we bring feature sizes of 0.13u and below into high volume manufacturing
  • Keywords
    automatic testing; fault diagnosis; inspection; integrated circuit testing; integrated circuit yield; product development; scanning electron microscopy; 0.13 mum; 0.13u; National Semiconductor; SEM images; SEM review; automated bitmapping; bitmapped yield enhancement; high volume manufacturing; inline detectable anomalies; optical images; process development; product development; rapid failure analysis; yield enhancement; yield learning; Automatic optical inspection; Failure analysis; Lead compounds; Maintenance engineering; Manufacturing automation; Optical detectors; Optical feedback; Product development; Semiconductor device manufacture; Ultraviolet sources;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Advanced Semiconductor Manufacturing Conference and Workshop, 2000 IEEE/SEMI
  • Conference_Location
    Boston, MA
  • ISSN
    1078-8743
  • Print_ISBN
    0-7803-5921-6
  • Type

    conf

  • DOI
    10.1109/ASMC.2000.902574
  • Filename
    902574