DocumentCode
2866753
Title
Managing arsenic in GaAs fab wastewater
Author
Peterson, Joel
Author_Institution
Motorola Inc., Tempe, AZ, USA
fYear
2000
fDate
2000
Firstpage
187
Lastpage
192
Abstract
The unprecedented demand for gallium arsenide integrated circuits presents manufacturers with a significant challenge, to maintain compliance with wastewater discharge limits for arsenic. Violating this limit can result in fines, interruption of operations, and even criminal liability. Recent action in the US regulatory arena suggests that this limit is likely to decrease dramatically in the near future. Consequently, management of this aspect of gallium arsenide manufacturing could have a significant impact on sustaining fab operations. The characteristics of typical arsenic-contributing wastewater streams are described as well as the processes and associated chemistry employed in conventional arsenic treatment. A brief overview of advanced and emerging technologies is presented as well as some of the results of recent evaluations in the Motorola “CS1” wastewater treatment operations
Keywords
III-V semiconductors; integrated circuit manufacture; legislation; water treatment; CS1; GaAs; Motorola; US regulatory arena; arsenic treatment; fab wastewater; wastewater discharge limits; Chemical technology; Chemistry; Fault location; Gallium arsenide; Integrated circuit manufacture; Investments; Manufacturing industries; Waste management; Wastewater treatment; Water resources;
fLanguage
English
Publisher
ieee
Conference_Titel
Advanced Semiconductor Manufacturing Conference and Workshop, 2000 IEEE/SEMI
Conference_Location
Boston, MA
ISSN
1078-8743
Print_ISBN
0-7803-5921-6
Type
conf
DOI
10.1109/ASMC.2000.902584
Filename
902584
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