• DocumentCode
    2866753
  • Title

    Managing arsenic in GaAs fab wastewater

  • Author

    Peterson, Joel

  • Author_Institution
    Motorola Inc., Tempe, AZ, USA
  • fYear
    2000
  • fDate
    2000
  • Firstpage
    187
  • Lastpage
    192
  • Abstract
    The unprecedented demand for gallium arsenide integrated circuits presents manufacturers with a significant challenge, to maintain compliance with wastewater discharge limits for arsenic. Violating this limit can result in fines, interruption of operations, and even criminal liability. Recent action in the US regulatory arena suggests that this limit is likely to decrease dramatically in the near future. Consequently, management of this aspect of gallium arsenide manufacturing could have a significant impact on sustaining fab operations. The characteristics of typical arsenic-contributing wastewater streams are described as well as the processes and associated chemistry employed in conventional arsenic treatment. A brief overview of advanced and emerging technologies is presented as well as some of the results of recent evaluations in the Motorola “CS1” wastewater treatment operations
  • Keywords
    III-V semiconductors; integrated circuit manufacture; legislation; water treatment; CS1; GaAs; Motorola; US regulatory arena; arsenic treatment; fab wastewater; wastewater discharge limits; Chemical technology; Chemistry; Fault location; Gallium arsenide; Integrated circuit manufacture; Investments; Manufacturing industries; Waste management; Wastewater treatment; Water resources;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Advanced Semiconductor Manufacturing Conference and Workshop, 2000 IEEE/SEMI
  • Conference_Location
    Boston, MA
  • ISSN
    1078-8743
  • Print_ISBN
    0-7803-5921-6
  • Type

    conf

  • DOI
    10.1109/ASMC.2000.902584
  • Filename
    902584