Title :
GC hard mask open tool CD monitoring and matching
Author :
Yu, Chien ; Bennett, Del ; Brown, Jeffrey
Author_Institution :
Adv. Semicond. Technol. Center, IBM Microelectron., East Fishkill, NY, USA
Abstract :
Critical dimension control of gate stack hard mask open is essential to good process yield. A sector monitoring scheme was developed to provide prompt feedback of any litho or etch process drift to protect product jobs. To match GC hard mask open CDs from multiple etch tools oxygen gas flow was employed to calibrate the CDs and provide the matching conditions for all the etch chambers
Keywords :
masks; process monitoring; sputter etching; CD matching; critical dimension control; etch tool; gate stack hard mask open; lithography; oxygen gas flow calibration; process yield; sector monitoring; semiconductor processing; Condition monitoring; Etching; Feedback; Fluid flow; Microelectronics; Plasma measurements; Polymers; Protection; Random access memory; Stability;
Conference_Titel :
Advanced Semiconductor Manufacturing Conference and Workshop, 2000 IEEE/SEMI
Conference_Location :
Boston, MA
Print_ISBN :
0-7803-5921-6
DOI :
10.1109/ASMC.2000.902600
