DocumentCode :
2867453
Title :
Productivity improvement focus at White Oak Semiconductor
Author :
Karzhavin, Yuri
Author_Institution :
White Oak Semiconductor, Sandston, VA, USA
fYear :
2000
fDate :
2000
Firstpage :
459
Lastpage :
465
Abstract :
Semiconductor manufacturing facility White Oak Semiconductor is working toward the implementation of a challenging goal: significant increase of wafer starts per week without adding new floor space to the existing clean room area. To this end a Productivity Improvement Project has been deployed across the factory. The Project is concentrated on efforts to improve equipment productivity, optimize equipment utilization, and the effectiveness of personnel. One of the most challenging areas of the factory is Etch. This paper focuses on the productivity improvement activities in the Etch area
Keywords :
clean rooms; etching; semiconductor device manufacture; White Oak Semiconductor; clean room; equipment productivity; equipment utilization; etching; factory layout; personnel effectiveness; productivity improvement project; semiconductor manufacturing facility; Etching; Manufacturing; Optimized production technology; Personnel; Production facilities; Productivity; Random access memory; Robots; Semiconductor device manufacture; Throughput;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Advanced Semiconductor Manufacturing Conference and Workshop, 2000 IEEE/SEMI
Conference_Location :
Boston, MA
ISSN :
1078-8743
Print_ISBN :
0-7803-5921-6
Type :
conf
DOI :
10.1109/ASMC.2000.902629
Filename :
902629
Link To Document :
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