DocumentCode :
286785
Title :
Multiplexed static and dynamic photorefraction at 780 nm in Bi12SiO20
Author :
Mailis, S. ; Vainos, N.A.
Author_Institution :
Inst. of Electr. Structure & Laser Found. for Res. & Technol., Hellas, Greece
fYear :
1993
fDate :
13-15 Sep 1993
Firstpage :
174
Lastpage :
179
Abstract :
The authors report preliminary results on the observation of multiplexed dynamic and static photorefractive behavior in the diffusion regime, at 780 nm in BSO. In the present case the dynamic gratings follow the expected response but the static gratings exhibit a lifetime which is nearly four orders of magnitude larger than the dynamic gratings at quite high erasing beam intensities. In addition both type of gratings exhibit comparable saturated diffraction efficiency values. Those effects may be attributed to strong participation of at least two distinct PR centers
Keywords :
bismuth compounds; holographic gratings; multiwave mixing; photorefractive materials; 780 nm; Bi12SiO20; diffusion regime; donor-acceptor states; dynamic gratings; dynamic photorefraction; four-wave mixing; holographic gratings; multiplexed photorefractive behaviour; saturated diffraction efficiency; static gratings; static photorefractive; trapped holes;
fLanguage :
English
Publisher :
iet
Conference_Titel :
Holographic Systems, Components and Applications, 1993., Fourth International Conference on
Conference_Location :
Neuchatel
Print_ISBN :
0-85296-578-8
Type :
conf
Filename :
263298
Link To Document :
بازگشت