Title :
Direct IC pattern generation by laser writing
Author :
Moulic, J. ; Kleinfelder, W.
Author_Institution :
IBM Corp, Poughkeepsie, NY, USA
Abstract :
A flexible IC pattern-generating laser, tool enabling modification of features by direct photoresist exposure, while viewing existing patterns, will be covered. Technique eliminates need for precision registration alignment.
Keywords :
Aluminum; Chemical lasers; Control systems; Laser modes; Laser transitions; Optical control; Optical design; Power lasers; Resists; Writing;
Conference_Titel :
Solid-State Circuits Conference. Digest of Technical Papers. 1980 IEEE International
Conference_Location :
San Francisco, CA, USA
DOI :
10.1109/ISSCC.1980.1156073
