DocumentCode
2871532
Title
Ultra-thin multilayer nanomembranes for short wavelength deformable optics
Author
Tripp, Marie K. ; Herrmann, Cari F. ; George, Steven M. ; Bright, Victor M.
Author_Institution
Dept. of Mech. Eng., Colorado Univ., Boulder, CO, USA
fYear
2004
fDate
2004
Firstpage
77
Lastpage
80
Abstract
Due to their unique optical properties, deformable multilayer membranes are of interest for adaptive optics. In this paper, we present the fabrication and characterization of a deformable membrane with nanometer scale thickness. This work explores the creation of adaptive optics out of multilayer thin films deposited using atomic layer deposition (ALD). SOIMUMPs, ALD, flip-chip assembly, and xenon difluoride (XeF2) etching are used in the fabrication process. An assembled device is presented along with an electro-static characterization and interferograms to examine the deformable nature of the membrane surface. To our knowledge these are the first microstructures created with the ALD technique.
Keywords
adaptive optics; atomic layer deposition; electrostatics; membranes; nanotechnology; optical fabrication; optical multilayers; adaptive optics; atomic layer deposition; deformable membranes fabrication; electrostatic characterization; interferograms; multilayer thin films deposition; nanometer scale thickness; short wavelength deformable optics; ultra thin multilayer nanomembranes; xenon difluoride etching; Adaptive optics; Assembly; Atom optics; Atomic layer deposition; Biomembranes; Nonhomogeneous media; Optical device fabrication; Optical films; Sputtering; Xenon;
fLanguage
English
Publisher
ieee
Conference_Titel
Micro Electro Mechanical Systems, 2004. 17th IEEE International Conference on. (MEMS)
Print_ISBN
0-7803-8265-X
Type
conf
DOI
10.1109/MEMS.2004.1290526
Filename
1290526
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