• DocumentCode
    2871532
  • Title

    Ultra-thin multilayer nanomembranes for short wavelength deformable optics

  • Author

    Tripp, Marie K. ; Herrmann, Cari F. ; George, Steven M. ; Bright, Victor M.

  • Author_Institution
    Dept. of Mech. Eng., Colorado Univ., Boulder, CO, USA
  • fYear
    2004
  • fDate
    2004
  • Firstpage
    77
  • Lastpage
    80
  • Abstract
    Due to their unique optical properties, deformable multilayer membranes are of interest for adaptive optics. In this paper, we present the fabrication and characterization of a deformable membrane with nanometer scale thickness. This work explores the creation of adaptive optics out of multilayer thin films deposited using atomic layer deposition (ALD). SOIMUMPs, ALD, flip-chip assembly, and xenon difluoride (XeF2) etching are used in the fabrication process. An assembled device is presented along with an electro-static characterization and interferograms to examine the deformable nature of the membrane surface. To our knowledge these are the first microstructures created with the ALD technique.
  • Keywords
    adaptive optics; atomic layer deposition; electrostatics; membranes; nanotechnology; optical fabrication; optical multilayers; adaptive optics; atomic layer deposition; deformable membranes fabrication; electrostatic characterization; interferograms; multilayer thin films deposition; nanometer scale thickness; short wavelength deformable optics; ultra thin multilayer nanomembranes; xenon difluoride etching; Adaptive optics; Assembly; Atom optics; Atomic layer deposition; Biomembranes; Nonhomogeneous media; Optical device fabrication; Optical films; Sputtering; Xenon;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Micro Electro Mechanical Systems, 2004. 17th IEEE International Conference on. (MEMS)
  • Print_ISBN
    0-7803-8265-X
  • Type

    conf

  • DOI
    10.1109/MEMS.2004.1290526
  • Filename
    1290526