Title :
Integration of the DRIE, MUMPs, and bulk micromachining for superior micro-optical systems
Author :
Wu, Mingching ; Lai, Chun-Feng ; Fang, Weileun
Author_Institution :
Power Mech. Eng., Nat. Tsing Hua Univ., Hsinchu, Taiwan
Abstract :
This work integrates multi-depth DRIE etching, two-poly MUMPs, and bulk releasing to accomplish superior poly-Si micro-optical systems. The stiffness of the devices was significantly increased using the trench-refilled rib structure, so that the radius of curvature (ROC) of the 2 μm thick mirror even reached 150 mm. In addition, the space between the devices and the substrate was remarkably increased to ∼100 μm by bulk silicon etching. Moreover, the self-aligned vertical comb actuators were available through the multi-depth DRIE etching. In application, the scanning mirrors driven by vertical comb actuator were demonstrated. The scanning angle was ±3 degrees (optical angle) at 40 V driving voltages (DC) and resonant frequency was 1.8 kHz. These poly-Si micro-optical devices can further integrate with the MUMPs devices to establish a more powerful MOEMS platform.
Keywords :
elemental semiconductors; integrated optics; microactuators; micromachining; micromirrors; optical fabrication; optical scanners; silicon; sputter etching; 1.8 kHz; 150 mm; 2 micron; 40 V; Si; bulk micromachining; bulk silicon etching; direct reactive ion etching; microoptoelectromechanical systems; radius of curvature; resonant frequency; scanning mirrors; superior polysilicon micro optical systems; vertical comb actuators; Actuators; Electrodes; Etching; Micromachining; Mirrors; Optical devices; Optical films; Residual stresses; Silicon; Voltage;
Conference_Titel :
Micro Electro Mechanical Systems, 2004. 17th IEEE International Conference on. (MEMS)
Print_ISBN :
0-7803-8265-X
DOI :
10.1109/MEMS.2004.1290531