DocumentCode :
2872113
Title :
Ge on Si by novel heteroepitaxy for high efficiency near infrared photodetection
Author :
Okyay, Ali K. ; Nayfeh, Ammar M. ; Saraswat, Krishna C. ; Marshall, Ann ; McIntyre, Paul C. ; Yonehara, Takao
Author_Institution :
Dept. of Electr. Eng., Stanford Univ., Stanford, CA
fYear :
2006
fDate :
21-26 May 2006
Firstpage :
1
Lastpage :
2
Abstract :
We report germanium-on-silicon MSM photodetectors with responsivities as high as 0.85 A/W at 1.55 mum and 2 V reverse bias, and exhibit reverse dark currents of 100 mA/cm2 and external quantum efficiency up to 68%.
Keywords :
dark conductivity; elemental semiconductors; epitaxial growth; germanium; infrared detectors; metal-semiconductor-metal structures; photodetectors; semiconductor epitaxial layers; semiconductor growth; silicon; Ge-Si; detector responsivity; external quantum efficiency; germanium-on-silicon MSM photodetectors; heteroepitaxial growth; reverse bias; reverse dark currents; voltage 2 V; wavelength 1.55 mum; CMOS technology; Dark current; Electrodes; Infrared spectra; Materials science and technology; Optical films; Photodetectors; Schottky diodes; Semiconductor films; Silicon; (040.3060) Infrared; (040.5160) Photodetectors;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Lasers and Electro-Optics, 2006 and 2006 Quantum Electronics and Laser Science Conference. CLEO/QELS 2006. Conference on
Conference_Location :
Long Beach, CA
Print_ISBN :
978-1-55752-813-1
Electronic_ISBN :
978-1-55752-813-1
Type :
conf
DOI :
10.1109/CLEO.2006.4628294
Filename :
4628294
Link To Document :
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