Title :
Silicon-germanium polycrystalline films for TFT applications
Author :
Reif, Rafael ; Tsai, Julie A.
Author_Institution :
Massachusetts Institute of Technology
Keywords :
Germanium silicon alloys; Grain size; Plasma immersion ion implantation; Plasma measurements; Plasma properties; Plasma temperature; Semiconductor films; Silicon germanium; Surface morphology; Thin film transistors;
Conference_Titel :
Electron Devices and Materials Symposium, 1994. EDMS 1994. 1994 International
DOI :
10.1109/EDMS.1994.771135
