• DocumentCode
    2873638
  • Title

    Fault location using electron beam current absorbed in LSI interconnects

  • Author

    Mizukoshi, K. ; Oyamada, T. ; Shimase, A. ; Matsumoto, Y. ; Yorisaki, S. ; Majima, T.

  • Author_Institution
    Renesas Technol. Corp., Hyogo, Japan
  • fYear
    2004
  • fDate
    26-28 July 2004
  • Firstpage
    31
  • Lastpage
    32
  • Abstract
    This paper introduced the developed apparatus named electron beam absorbed current (EBAC) to locate fault sites in LSI interconnects. This technique has a potential to become an effective tool and is driven forward to extended applications.
  • Keywords
    electron beam testing; integrated circuit interconnections; integrated circuit testing; large scale integration; EBAC; LSI interconnects; electron beam absorbed current; fault location; Circuit analysis; Circuit faults; Circuit testing; Electrical fault detection; Electron beams; Failure analysis; Fault location; Integrated circuit interconnections; Large scale integration; Probes;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Future of Electron Devices, 2004. International Meeting for
  • Print_ISBN
    0-7803-8423-7
  • Electronic_ISBN
    0-7803-8424-5
  • Type

    conf

  • DOI
    10.1109/IMFEDK.2004.1566393
  • Filename
    1566393
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=2873638