DocumentCode
2874035
Title
A new buffered p+ poly-gate for suppression of boron penetration effect
Author
Lin, Chih Yung ; Chang, Chun-Yen ; Chou, Jih Wen ; Pan, Hong-Tsz ; Lin, Chih Hung ; Ko, Joe
Author_Institution
National Chiao Tung University
fYear
1994
fDate
1994
Firstpage
42494
Lastpage
43589
Keywords
Amorphous silicon; Boron; CMOS technology; Capacitance-voltage characteristics; Electrodes; Etching; Laboratories; MOSFET circuits; Microelectronics; Threshold voltage;
fLanguage
English
Publisher
ieee
Conference_Titel
Electron Devices and Materials Symposium, 1994. EDMS 1994. 1994 International
Type
conf
DOI
10.1109/EDMS.1994.771215
Filename
771215
Link To Document