Title :
Improvement in proton beam writing at the nano scale
Author :
van Kan, J.A. ; Bettiol, A.A. ; Ansari, K. ; Shao, P. ; Watt, F.
Author_Institution :
Centre for Ion Beam Applications, Nat. Univ. of Singapore, Singapore
Abstract :
Here we report on the progress of 3D nano machining using MeV protons. In proton beam (p-beam) writing a proton beam is typically focused down to a sub 100 nm spot size and scanned over a resist material (e.g. Su-8 or PMMA). Currently the scanning is performed using a magnetic scan coil which has an intrinsically long settling time. A new scanning system is introduced which employs electrostatic scanning and allows an increase in writing speed up to 2 orders of magnitude.
Keywords :
nanolithography; polymer films; proton effects; resists; scanning electron microscopy; 100 nm; 3D nano machining; PMMA; electrostatic scanning; magnetic scan coil; nano scale; proton beam; scanning system; Coils; Electrostatics; Ion beam applications; Lenses; Microelectronics; Particle beams; Production; Protons; Resists; Writing;
Conference_Titel :
Micro Electro Mechanical Systems, 2004. 17th IEEE International Conference on. (MEMS)
Print_ISBN :
0-7803-8265-X
DOI :
10.1109/MEMS.2004.1290674