• DocumentCode
    2874197
  • Title

    Improvement in proton beam writing at the nano scale

  • Author

    van Kan, J.A. ; Bettiol, A.A. ; Ansari, K. ; Shao, P. ; Watt, F.

  • Author_Institution
    Centre for Ion Beam Applications, Nat. Univ. of Singapore, Singapore
  • fYear
    2004
  • fDate
    2004
  • Firstpage
    673
  • Lastpage
    676
  • Abstract
    Here we report on the progress of 3D nano machining using MeV protons. In proton beam (p-beam) writing a proton beam is typically focused down to a sub 100 nm spot size and scanned over a resist material (e.g. Su-8 or PMMA). Currently the scanning is performed using a magnetic scan coil which has an intrinsically long settling time. A new scanning system is introduced which employs electrostatic scanning and allows an increase in writing speed up to 2 orders of magnitude.
  • Keywords
    nanolithography; polymer films; proton effects; resists; scanning electron microscopy; 100 nm; 3D nano machining; PMMA; electrostatic scanning; magnetic scan coil; nano scale; proton beam; scanning system; Coils; Electrostatics; Ion beam applications; Lenses; Microelectronics; Particle beams; Production; Protons; Resists; Writing;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Micro Electro Mechanical Systems, 2004. 17th IEEE International Conference on. (MEMS)
  • Print_ISBN
    0-7803-8265-X
  • Type

    conf

  • DOI
    10.1109/MEMS.2004.1290674
  • Filename
    1290674