DocumentCode
2874197
Title
Improvement in proton beam writing at the nano scale
Author
van Kan, J.A. ; Bettiol, A.A. ; Ansari, K. ; Shao, P. ; Watt, F.
Author_Institution
Centre for Ion Beam Applications, Nat. Univ. of Singapore, Singapore
fYear
2004
fDate
2004
Firstpage
673
Lastpage
676
Abstract
Here we report on the progress of 3D nano machining using MeV protons. In proton beam (p-beam) writing a proton beam is typically focused down to a sub 100 nm spot size and scanned over a resist material (e.g. Su-8 or PMMA). Currently the scanning is performed using a magnetic scan coil which has an intrinsically long settling time. A new scanning system is introduced which employs electrostatic scanning and allows an increase in writing speed up to 2 orders of magnitude.
Keywords
nanolithography; polymer films; proton effects; resists; scanning electron microscopy; 100 nm; 3D nano machining; PMMA; electrostatic scanning; magnetic scan coil; nano scale; proton beam; scanning system; Coils; Electrostatics; Ion beam applications; Lenses; Microelectronics; Particle beams; Production; Protons; Resists; Writing;
fLanguage
English
Publisher
ieee
Conference_Titel
Micro Electro Mechanical Systems, 2004. 17th IEEE International Conference on. (MEMS)
Print_ISBN
0-7803-8265-X
Type
conf
DOI
10.1109/MEMS.2004.1290674
Filename
1290674
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