DocumentCode
2874746
Title
A 5V-only 16K EEPROM utilizing oxynitride dielectrics and EPROM redundancy
Author
Gupta, A. ; Te-Long Chiu ; Chang, M. ; Renninger, A. ; Perlegos, G.
Author_Institution
SEEQ Technology Incorporated, San Jose, CA, USA
Volume
XXV
fYear
1982
fDate
10-12 Feb. 1982
Firstpage
184
Lastpage
185
Abstract
MEMORY DEVICES utilizing EEPROM cells have been widely pursued. In recent years the ability to grow high-quality thin dielectric in the range of lOOA has brought about the development of EEPROM cells which utilize electron tunneling for both program and erase. However, in previous EEPROM designs?? utllmng thea bove approach, an additional 20Vo r higher supply is required for programming which makes it incompatible with future microprocessor systems. This paper will describe an N-channel2K x 8 EEPROM where reading, writing and erasing operations are from a single 5V supply. This is achieved through a low-power cell design utilizing oxynitride tunnel dielectric and through internal charge pump circuitry for voltage multiplication.
Keywords
Breakdown voltage; CMOS technology; Charge pumps; Circuits; Dielectrics; EPROM; Electrons; Voltage control;
fLanguage
English
Publisher
ieee
Conference_Titel
Solid-State Circuits Conference. Digest of Technical Papers. 1982 IEEE International
Conference_Location
San Francisco, CA, USA
Type
conf
DOI
10.1109/ISSCC.1982.1156369
Filename
1156369
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