DocumentCode
2875387
Title
Nanometer-scale deposition of ytterbium atoms
Author
Ohmukai, R. ; Kurihara, K. ; Hyodo, M. ; Nakayama, K. ; Watanabe, M. ; Kondo, H.
Author_Institution
Nat. Inst. of Inf. & Commun. Technol., Kobe
fYear
2006
fDate
21-26 May 2006
Firstpage
1
Lastpage
2
Abstract
We report the first demonstration of atomic nanofabrication using ytterbium atoms and a near-resonant light. We discuss a lithographic technique based on numerical simulations using an extremely far-off resonant laser light as an optical mask.
Keywords
atom-photon collisions; laser beam applications; masks; nanotechnology; photolithography; radiation pressure; ytterbium; Yb; atomic nanofabrication; laser cooling; lithographic technique; nanometer-scale deposition; near-resonant light; optical mask; optical trapping; resonant laser light; ytterbium atoms; Atom optics; Atomic beams; Atomic layer deposition; Atomic measurements; Laser beams; Nanofabrication; Optical harmonic generation; Optical scattering; Resonance; Ytterbium; (140.0140) Lasers and laser optics; (140.7010) Trapping;
fLanguage
English
Publisher
ieee
Conference_Titel
Lasers and Electro-Optics, 2006 and 2006 Quantum Electronics and Laser Science Conference. CLEO/QELS 2006. Conference on
Conference_Location
Long Beach, CA
Print_ISBN
978-1-55752-813-1
Electronic_ISBN
978-1-55752-813-1
Type
conf
DOI
10.1109/CLEO.2006.4628496
Filename
4628496
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