Title :
Nanometer-scale deposition of ytterbium atoms
Author :
Ohmukai, R. ; Kurihara, K. ; Hyodo, M. ; Nakayama, K. ; Watanabe, M. ; Kondo, H.
Author_Institution :
Nat. Inst. of Inf. & Commun. Technol., Kobe
Abstract :
We report the first demonstration of atomic nanofabrication using ytterbium atoms and a near-resonant light. We discuss a lithographic technique based on numerical simulations using an extremely far-off resonant laser light as an optical mask.
Keywords :
atom-photon collisions; laser beam applications; masks; nanotechnology; photolithography; radiation pressure; ytterbium; Yb; atomic nanofabrication; laser cooling; lithographic technique; nanometer-scale deposition; near-resonant light; optical mask; optical trapping; resonant laser light; ytterbium atoms; Atom optics; Atomic beams; Atomic layer deposition; Atomic measurements; Laser beams; Nanofabrication; Optical harmonic generation; Optical scattering; Resonance; Ytterbium; (140.0140) Lasers and laser optics; (140.7010) Trapping;
Conference_Titel :
Lasers and Electro-Optics, 2006 and 2006 Quantum Electronics and Laser Science Conference. CLEO/QELS 2006. Conference on
Conference_Location :
Long Beach, CA
Print_ISBN :
978-1-55752-813-1
Electronic_ISBN :
978-1-55752-813-1
DOI :
10.1109/CLEO.2006.4628496
