Title :
The impact of ion-implantation damage on dopant diffusion
Author :
Chang, Ruey-Dar ; Deng, Ray-Chen ; Hsu, Show-In ; Chiang, Song-Tang
Author_Institution :
Industrial Technology Research Institute
Keywords :
Annealing; Boron; Diffusion processes; Doping profiles; Implants; Industrial electronics; Ion implantation; Lattices; Semiconductor process modeling; Silicon;
Conference_Titel :
Electron Devices and Materials Symposium, 1994. EDMS 1994. 1994 International
DOI :
10.1109/EDMS.1994.771355
