DocumentCode :
2875721
Title :
A recombination model for the low current performance of submicron devices
Author :
Lefferts, R. ; Swan, R. ; Meindl, J.
Author_Institution :
Tektronix, Inc., Beaverton, OR, USA
Volume :
XXV
fYear :
1982
fDate :
10-12 Feb. 1982
Firstpage :
16
Lastpage :
17
Abstract :
This paper will cover a generation-recombination model which describes the influence of metallic precipitates on the current gain, leakage current, and 1/f noise of small geometry transistors. The model predicts an increase in device sensitivity to contamination as geometries are reduced to submicron dimensions.
Keywords :
Bipolar transistors; Doping; Leakage current; MOSFETs; Predictive models; Radiative recombination; Semiconductor device noise; Semiconductor diodes; Semiconductor process modeling; Spontaneous emission;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Solid-State Circuits Conference. Digest of Technical Papers. 1982 IEEE International
Conference_Location :
San Francisco, CA, USA
Type :
conf
DOI :
10.1109/ISSCC.1982.1156422
Filename :
1156422
Link To Document :
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