Lithographically fabricated micro-optical array beam shapers for ultra-short pulse lasers

Author

Ferstl, Margit ; Devendra, Geethaka ; Grunwald, Ruediger ; Bock, Martin

Author_Institution

Fraunhofer Inst. for Telecommun., Heinrich-Hertz-Inst., Berlin

fYear

2006

fDate

21-26 May 2006

Firstpage

1

Lastpage

2

Abstract

Reflective micro-optical components for shaping non-diffracting beam arrays were fabricated by proportional transfer of continuous resist profiles into silica and silicon via e-beam writing and gray-tone lithography. Low dispersion multiplexing of 10-fs pulses was demonstrated.

Keywords

electron beam applications; elemental semiconductors; high-speed optical techniques; lithography; micro-optics; multiplexing; optical arrays; optical fabrication; optical pulse shaping; silicon; silicon compounds; Si; SiO₂; beam array shaping; continuous resist profiles; electron-beam writing; femtosecond pulses; gray-tone lithography; lithographic fabrication; low dispersion multiplexing; microoptical array beam shapers; nondiffracting beam arrays; reflective microoptical components; silica; silicon; time 10 fs; ultrashort pulse lasers; Etching; Glass; Laser beams; Lithography; Nonlinear optics; Optical arrays; Optical pulse shaping; Resists; Silicon; Writing; (220.3740) Lithography; (320.0320) Ultrafast optics; (350.3950) Micro-optics;

fLanguage

English

Publisher

ieee

Conference_Titel

Lasers and Electro-Optics, 2006 and 2006 Quantum Electronics and Laser Science Conference. CLEO/QELS 2006. Conference on

Conference_Location

Long Beach, CA

Print_ISBN

978-1-55752-813-1

Electronic_ISBN

978-1-55752-813-1

Type

conf

DOI

10.1109/CLEO.2006.4628560

Filename

4628560