DocumentCode :
2877676
Title :
Application of AFP (Atomic Force Probing) on the failure analysis of 65nm technology SRAM
Author :
Changing, Chen ; Yan, Li ; GhimBoon, Ang ; Qingxiao, Wang
Author_Institution :
Globalfoundries, Singapore, Singapore
fYear :
2011
fDate :
4-7 July 2011
Firstpage :
1
Lastpage :
4
Abstract :
Static random-access memory (SRAM) is a critical component across production and application. So the failure analysis for the SRAM is very important for the monitoring of the process. With the scale down of the technology, there come more challenges that the traditional method cannot deal with. In this paper, a real case of 65nm technology SRAM was studied. Nothing abnormal was found by the traditional FA method. A new method, current image-Atom Force Microscopy combined with Atom Force Probing, was employed. Abnormal current image contrast and abnormal family curve in the transistors of the SRAM cell was obtained easily According to the AFP result, the defect position was localized. TEM and EDX were performed on the localized position, and root cause was found.
Keywords :
SRAM chips; X-ray chemical analysis; atomic force microscopy; failure analysis; transmission electron microscopy; EDX; SRAM; TEM; atomic force probing; current image contrast; current image-atom force microscopy; failure analysis; family curve; localized defect position; size 65 nm; static random-access memory; Failure analysis; Force; Imaging; Layout; Random access memory; Transistors;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Physical and Failure Analysis of Integrated Circuits (IPFA), 2011 18th IEEE International Symposium on the
Conference_Location :
Incheon
ISSN :
1946-1542
Print_ISBN :
978-1-4577-0159-7
Electronic_ISBN :
1946-1542
Type :
conf
DOI :
10.1109/IPFA.2011.5992765
Filename :
5992765
Link To Document :
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