• DocumentCode
    2877676
  • Title

    Application of AFP (Atomic Force Probing) on the failure analysis of 65nm technology SRAM

  • Author

    Changing, Chen ; Yan, Li ; GhimBoon, Ang ; Qingxiao, Wang

  • Author_Institution
    Globalfoundries, Singapore, Singapore
  • fYear
    2011
  • fDate
    4-7 July 2011
  • Firstpage
    1
  • Lastpage
    4
  • Abstract
    Static random-access memory (SRAM) is a critical component across production and application. So the failure analysis for the SRAM is very important for the monitoring of the process. With the scale down of the technology, there come more challenges that the traditional method cannot deal with. In this paper, a real case of 65nm technology SRAM was studied. Nothing abnormal was found by the traditional FA method. A new method, current image-Atom Force Microscopy combined with Atom Force Probing, was employed. Abnormal current image contrast and abnormal family curve in the transistors of the SRAM cell was obtained easily According to the AFP result, the defect position was localized. TEM and EDX were performed on the localized position, and root cause was found.
  • Keywords
    SRAM chips; X-ray chemical analysis; atomic force microscopy; failure analysis; transmission electron microscopy; EDX; SRAM; TEM; atomic force probing; current image contrast; current image-atom force microscopy; failure analysis; family curve; localized defect position; size 65 nm; static random-access memory; Failure analysis; Force; Imaging; Layout; Random access memory; Transistors;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Physical and Failure Analysis of Integrated Circuits (IPFA), 2011 18th IEEE International Symposium on the
  • Conference_Location
    Incheon
  • ISSN
    1946-1542
  • Print_ISBN
    978-1-4577-0159-7
  • Electronic_ISBN
    1946-1542
  • Type

    conf

  • DOI
    10.1109/IPFA.2011.5992765
  • Filename
    5992765