DocumentCode
2877873
Title
Fabrication of silicon 3D photonic crystal structures in 100nm scale using double directional etchings method
Author
Hippo, Daihei ; Kawata, Yoshiyuki ; Tsuchiya, Yoshishige ; Mizuta, Hiroshi ; Oda, Shunri ; Urakawa, Kei ; Koshida, Nobuyoshi
Author_Institution
Dept. of Phys. Electron., Tokyo Inst. of Technol. & SORST-JST, Tokyo
fYear
2006
fDate
21-26 May 2006
Firstpage
1
Lastpage
2
Abstract
We have reported periodic pore formation with diameter in 80 nm and aspect ratio above 250 on N+(100) silicon substrate and demonstrated the fabrication of silicon 3-dimensional microstructures by applying double directional etchings method.
Keywords
elemental semiconductors; etching; nanophotonics; optical fabrication; photonic crystals; silicon; Si; double directional etchings; periodic pore formation; photonic crystal structures; silicon substrate; size 100 nm; size 80 nm; Etching; Magnetic fields; Microstructure; Optical device fabrication; Periodic structures; Photonic crystals; Plasma temperature; Rough surfaces; Silicon; Surface roughness; (220.3740)Lithography; (230.4000) Microstructure fabrication;
fLanguage
English
Publisher
ieee
Conference_Titel
Lasers and Electro-Optics, 2006 and 2006 Quantum Electronics and Laser Science Conference. CLEO/QELS 2006. Conference on
Conference_Location
Long Beach, CA
Print_ISBN
978-1-55752-813-1
Electronic_ISBN
978-1-55752-813-1
Type
conf
DOI
10.1109/CLEO.2006.4628638
Filename
4628638
Link To Document