• DocumentCode
    2878863
  • Title

    Plasma acid and its applications

  • Author

    Shainsky, N. ; Dobrynin, D. ; Ercan, U. ; Joshi, S. ; Brooks, A. ; Haifeng Ji ; Fridman, G. ; Young Cho ; Fridman, A. ; Friedman, G.

  • Author_Institution
    A.J. Drexel Plasma Inst., Drexel Univ., Philadelphia, PA, USA
  • fYear
    2011
  • fDate
    26-30 June 2011
  • Firstpage
    1
  • Lastpage
    1
  • Abstract
    Summary form only given. Non-thermal atmospheric pressure plasma applied to the surface of water can oxidize organic molecules in the solution and kill bacteria in it. Ozonation of water produce a solution that retains its oxidation potential for several minutes. We show that direct exposure of deionized water not only to ozone but to other neutral and charged species produced in plasma creates a strong oxidizer in this water which, for the lack of a better term, we can call plasma acid. Plasma acid can remain stable for much longer time than ozonated water and its oxidizing power may be linked to the significant lowering of its pH. We report experiments that demonstrate plasma acid´s stability. We also show that observed pH of as low as 2.0 cannot be completely accounted for by the production of nitric acid; and that the conjugate base derived from superoxide is at least partly responsible for both, lowering of the pH and increase in the oxidizing power of the solution. Existence of a stable oxidizer created using plasma treatment of pure water not only raises interesting scientific questions and possibilities, but is likely to find many applications in situations where “on the spot” plasma treatment may be difficult to achieve.
  • Keywords
    oxidation; ozonation (materials processing); pH; plasma chemistry; plasma instability; plasma materials processing; water; H2O; bacteria; deionized water; nonthermal atmospheric pressure plasma; organic molecules; oxidation potential; ozonation; pH; plasma acid; plasma stability; plasma treatment; Plasmas;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Plasma Science (ICOPS), 2011 Abstracts IEEE International Conference on
  • Conference_Location
    Chicago, IL
  • ISSN
    0730-9244
  • Print_ISBN
    978-1-61284-330-8
  • Electronic_ISBN
    0730-9244
  • Type

    conf

  • DOI
    10.1109/PLASMA.2011.5992900
  • Filename
    5992900