DocumentCode :
2879282
Title :
Frequency probe measurements in processing plasmas
Author :
Boris, D.R. ; Walton, S.G. ; Fernsler, R.F.
Author_Institution :
Plasma Phys. Div., Naval Res. Lab., Washington, DC, USA
fYear :
2011
fDate :
26-30 June 2011
Firstpage :
1
Lastpage :
1
Abstract :
Summary form only given. Plasma density measurements are an essential tool in understanding and controlling processing plasmas across a wide range of applications. Charge collection probes (Langmuir probes) are of limited utility in depositing plasmas, high pressure applications or in processes that require the use of reactive gases, as these environments result in unreliable data acquisition. Plasma frequency probes are an attractive alternative to Langmuir probes in such applications since they do not suffer significant performance degradation in these environments. In addition frequency probes provide the same array of plasma parameters for which Langmuir probes are used (plasma density, electron temperature, plasma potential and electron energy distributions). This work presents frequency probes measurements of plasma density over a range of 109 to 1012 cm-3 in a variety of processing plasma chemistries (N2, CH4, NH4, O2 and SF6). This work also features frequency probe measurements of plasma potential, electron temperature, and electron energy distribution functions in the gas chemistries mentioned above.
Keywords :
Langmuir probes; plasma chemistry; plasma density; plasma deposition; plasma temperature; Langmuir probes; charge collection probes; data acquisition; electron energy distribution functions; electron temperature; frequency probe measurements; gas chemistries; high pressure applications; performance degradation; plasma chemistries; plasma density measurements; plasma deposition; plasma frequency probes; plasma potential; reactive gases; Frequency measurement; Plasma measurements; Probes;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Plasma Science (ICOPS), 2011 Abstracts IEEE International Conference on
Conference_Location :
Chicago, IL
ISSN :
0730-9244
Print_ISBN :
978-1-61284-330-8
Electronic_ISBN :
0730-9244
Type :
conf
DOI :
10.1109/PLASMA.2011.5992925
Filename :
5992925
Link To Document :
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