DocumentCode :
287976
Title :
Automated correlation of electrical failures to in-line inspections in a submicron semiconductor wafer fab
Author :
McCormack, John
fYear :
1994
fDate :
34451
Firstpage :
42522
Lastpage :
42526
Abstract :
This paper summarises the status of work ongoing to correlate electrical failure sites in memory devices to in-line inspection data, with the ultimate objective of supporting yield improvement through the isolation of cause and effect mechanisms. The use of the KLA2130 and the Tencor SS7200 automatic systems has proved to be complimentary in linking in-line defectivity with electrical failures. The corresponding analysis approaches have different strengths and weaknesses: The KLA software provides important functionality, such as wafermaps, size distributions and pareto charts, but requires interactive use, whereas the analysis of Tencor data can be performed in batch mode, which can be advantageous in a data-rich environment
fLanguage :
English
Publisher :
iet
Conference_Titel :
Semiconductor Processing - Quality through Measurement, IEE Colloquium on
Conference_Location :
London
Type :
conf
Filename :
367913
Link To Document :
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