Title :
Design and analysis of beam apodizers using error diffusion
Author :
Dorrer, C. ; Zuegel, J.D.
Author_Institution :
Lab. for Laser Energetics, Univ. of Rochester, Rochester, NY
Abstract :
Beam apodization using binary amplitude masks designed with an error-diffusion algorithm is studied. High-shaping capability and predictability of mask properties is demonstrated for precompensation of the spatial gain variation of a glass amplifier.
Keywords :
laser beams; masks; optical images; optical pulse shaping; solid lasers; beam apodizer; beam shaping; binary amplitude masks; error diffusion; error-diffusion algorithm; glass amplifier; spatial gain variation; Algorithm design and analysis; Filtering; Glass; Laboratories; Laser beams; Optical amplifiers; Optical design; Optical filters; Pixel; Stimulated emission; (140.3300) Laser beam shaping; (220.1230) Apodization;
Conference_Titel :
Lasers and Electro-Optics, 2006 and 2006 Quantum Electronics and Laser Science Conference. CLEO/QELS 2006. Conference on
Conference_Location :
Long Beach, CA
Print_ISBN :
978-1-55752-813-1
Electronic_ISBN :
978-1-55752-813-1
DOI :
10.1109/CLEO.2006.4628830
