DocumentCode :
2881147
Title :
Sterilization effects of biofilms by Ar/O2 plasma jet
Author :
Taghizadeh, L. ; Nikiforov, A.Y. ; Leys, C. ; Brackman, G. ; Coenye, T.
Author_Institution :
Dept. of Appl. Phys., Ghent Univ., Ghent, Belgium
fYear :
2011
fDate :
26-30 June 2011
Firstpage :
1
Lastpage :
1
Abstract :
Summary form only given. When the effectiveness of chemicals are low due to natural pathogens or biofilm resistance, exposure to non-thermal plasma seems to be an alternative method for treating superficial wounds and skin infections. Understanding of the interactions between plasma species and pathogenic bacteria and yeast biofilms is a key for designing plasma source for medical applications. The goal of this study is to define an optimum Ar/O2 gas mixture to have maximum reduction of biofilm loads. Ar/O2 plasma jet is used to treat biofilms of prokaryotic and eukaryotic cells. Samples are treated under different conditions with respect to source-to-sample distance, treatment time, etc. Applied voltage and gas flow rate do not play roles on decreasing biofilm loads, significantly. Amount of UV radiation and temperature at the place of sample are controlled due to safety requirement. The results of this study suggest that plasma should be optimized in the direction of reducing the intensity of plasma-generated UV radiation and increasing the density of reactive oxygen plasma products.
Keywords :
argon; biological effects of ultraviolet radiation; gas mixtures; oxygen; plasma applications; plasma density; plasma jets; sterilisation (microbiological); wounds; Ar-O2; applied voltage; biofilm loads; biofilm resistance; eukaryotic cell; gas flow rate; maximum reduction; medical applications; natural pathogens; nonthermal plasma; optimum gas mixture; pathogenic bacteria; plasma jet; plasma source; plasma-generated UV radiation intensity; prokaryotic cell; reactive oxygen plasma product density; safety requirement; skin infections; source-to-sample distance; sterilization effects; superficial wounds; treatment time; yeast biofilms; Plasmas;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Plasma Science (ICOPS), 2011 Abstracts IEEE International Conference on
Conference_Location :
Chicago, IL
ISSN :
0730-9244
Print_ISBN :
978-1-61284-330-8
Electronic_ISBN :
0730-9244
Type :
conf
DOI :
10.1109/PLASMA.2011.5993037
Filename :
5993037
Link To Document :
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