Title :
Methods and tools for semiconductor annealing and silicon thin film crystallization using solid state lasers
Author :
Oesterlin, Peter ; Burghardt, Berthold ; Kahlert, Hans-Juergen ; Heglin, L. Michael
Author_Institution :
Innovavent GmbH, Gottingen
Abstract :
For future 65 nm and smaller nodes, thermal anneal processes in the ms and mus range are required. Based on laboratory tests using the line scan method, an R&D system has been developed.
Keywords :
annealing; crystallisation; elemental semiconductors; laser materials processing; silicon; solid lasers; thin films; Si; semiconductor annealing; size 65 nm; solid state lasers; thermal anneal processes; thin film crystallization; Annealing; Crystallization; Frequency; Laser beams; Optical pulses; Research and development; Semiconductor lasers; Semiconductor thin films; Silicon; Solid lasers; (140.3300) Laser beam shaping; (140.3390) Laser materials processing; (160.6000) Semiconductors;
Conference_Titel :
Lasers and Electro-Optics, 2006 and 2006 Quantum Electronics and Laser Science Conference. CLEO/QELS 2006. Conference on
Conference_Location :
Long Beach, CA
Print_ISBN :
978-1-55752-813-1
Electronic_ISBN :
978-1-55752-813-1
DOI :
10.1109/CLEO.2006.4628853
