DocumentCode
2881744
Title
High throughput laser doping for selective emitter crystalline Si solar cells
Author
Oesterlin, Peter ; Jäger, Ulrich
Author_Institution
INNOVAVENT GmbH, Goettingen, Germany
fYear
2010
fDate
Sept. 28 2010-Oct. 1 2010
Firstpage
146
Lastpage
153
Abstract
One of the most promising methods to improve the efficiency of crystalline solar cells is the implementation of so-called selective emitters. This is the decoupling of the requirements for the front doping for light conversion and metallization. Underneath the contact fingers, a high doping is chosen to insure a good ohmic contact, whereas in the photoactive area a light doping is employed to reduce recombination losses and increase quantum efficiency in the short wavelength region of the device. Besides using costly and lengthy masking processes, selective emitters can be produced using lasers by means of laser doping. A laser beam with a suitable wavelength with good absorption in silicon is focused to a spot size which matches the width of the contact fingers. In this paper the process is explained, results are presented which show that the targeted effect can be achieved without detrimental “side effects”, and an optical beam splitter technology for high throughput production is proposed.
Keywords
absorption coefficients; doping profiles; elemental semiconductors; metallisation; ohmic contacts; optical beam splitters; silicon; solar cells; Si; absorption coefficient; contact finger; laser beam effects; laser doping; metallization; ohmic contact; optical beam splitter technology; recombination loss; selective emitter crystalline solar cells; Coatings; Frequency measurement; Hafnium; Lasers; Performance evaluation; Surface treatment; Switches;
fLanguage
English
Publisher
ieee
Conference_Titel
Advanced Thermal Processing of Semiconductors (RTP), 2010 18th International Conference on
Conference_Location
Gainesville, FL
ISSN
1944-0251
Print_ISBN
978-1-4244-8400-3
Type
conf
DOI
10.1109/RTP.2010.5623806
Filename
5623806
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