• DocumentCode
    2882823
  • Title

    An improved self-consistent fitting model for characterizing field emitters

  • Author

    Lin, M.C. ; Lu, P.S. ; Verboncoeur, J.P.

  • Author_Institution
    NSSL, Fu Jen Catholic Univ., Taipei, Taiwan
  • fYear
    2011
  • fDate
    26-30 June 2011
  • Firstpage
    1
  • Lastpage
    1
  • Abstract
    Summary form only given. Field emission of electrons has attracted a lot of attention due to its wide applications in vacuum nano-electronics as well as understanding the fundamental surface physics. In recent experiments of field emission arrays (FEAs), the Fowler-Nordheim (FN) plots were found to become nonlinear and apart from the prediction of the conventional FN theory. A self-consistent model including the space charge and within the framework of an effective work function approximation demonstrated a good fit to the I-V characteristics of FEAs. Although the theory showed good agreement with the experiments and indicated that space charge effects cause the saturation, a constant effective work function is not enough to characterize all the emission surface properties as one can see a discrepancy in the transition region. A later study employing the effective enhancement factor model showed that geometric enhancement effects are strongly dependent on the applied fields. In this work, we employ both effective work function and effective enhancement factor approximations to improve the fitting model for better characterizing field emitters. Detailed results will be presented.
  • Keywords
    electron field emission; field emitter arrays; space charge; work function; I-V characteristics; effective enhancement factor model; effective work function approximation; electron field emission; field emission arrays; field emitters; geometric enhancement effects; nonlinear Fowler-Nordheim plots; saturation; self-consistent fitting model; space charge effects; vacuum nanoelectronics;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Plasma Science (ICOPS), 2011 Abstracts IEEE International Conference on
  • Conference_Location
    Chicago, IL
  • ISSN
    0730-9244
  • Print_ISBN
    978-1-61284-330-8
  • Electronic_ISBN
    0730-9244
  • Type

    conf

  • DOI
    10.1109/PLASMA.2011.5993160
  • Filename
    5993160